Presentation Title

Fabrication of Organic Ferroelectric Thin Films under Ultra-High Vacuum

Presenter Information

Francisco GuzmanFollow

Start Date

November 2016

End Date

November 2016

Location

Watkins 1111

Type of Presentation

Oral Talk

Abstract

In material science, ferroelectric materials have demonstrated diverse applications to non-volatile memory, energy harvesting, and optics. Currently, there is a higher demand for organic ferroelectrics due to their greater efficiency and economic scalable production. In order to access feasible alternatives for current inorganic ferroelectrics, the fabrication of organic ferroelectric thin films is essential. Therefore, the construction of an ultra-high vacuum system is required. Thus we have designed an ultra-high vacuum system (1 x 10-9 torr) in which a thermal evaporation system was developed. Through this approach, an organic thin film of croconic acid was deposited onto a glass substrate. The experimental conditions for optimizing ultra thin film at nm scale were explored. The thickness of the film measured via microbalance was compared with those measured via atomic force microscope (AFM) and the calibration curve was established for the future in-situ sample preparation.

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Nov 12th, 11:00 AM Nov 12th, 11:15 AM

Fabrication of Organic Ferroelectric Thin Films under Ultra-High Vacuum

Watkins 1111

In material science, ferroelectric materials have demonstrated diverse applications to non-volatile memory, energy harvesting, and optics. Currently, there is a higher demand for organic ferroelectrics due to their greater efficiency and economic scalable production. In order to access feasible alternatives for current inorganic ferroelectrics, the fabrication of organic ferroelectric thin films is essential. Therefore, the construction of an ultra-high vacuum system is required. Thus we have designed an ultra-high vacuum system (1 x 10-9 torr) in which a thermal evaporation system was developed. Through this approach, an organic thin film of croconic acid was deposited onto a glass substrate. The experimental conditions for optimizing ultra thin film at nm scale were explored. The thickness of the film measured via microbalance was compared with those measured via atomic force microscope (AFM) and the calibration curve was established for the future in-situ sample preparation.