Presentation Title

Fabricating high-quality ultra-thin croconic acid film using electric field guidance

Faculty Mentor

Renwu Zhang, Kimberly Cousin, Sara J. Callori, Paul K. Dixon, Douglas Smith, Timothy Usher

Start Date

18-11-2017 9:45 AM

End Date

18-11-2017 10:00 AM

Location

9-263

Session

Physical Sciences 3

Type of Presentation

Oral Talk

Subject Area

physical_mathematical_sciences

Abstract

A novel method for fabricating ultra-thin croconic acid (CA) films with a very low surface roughness on Si wafers is reported. With a thickness of approximately 20 nm and surface roughness of ±2.0 nm, the film obtained far exceeds the quality and smoothness of previously reported CA thin films. The film is prepared by applying a high electric field in situ during thermal vapor deposition, promoting alignment of the CA molecules due to their high dipole moment. The result is compared with that of the best-reported film produced via a combination of thermal evaporation at low substrate temperature with subsequent slow heating, to demonstrate the greatly enhanced uniformness of the film. In addition, the film’s ferroelectric behavior is demonstrated using piezoresponse force microscopy measurements. A mechanism for film formation under electric field assisted deposition is proposed.

Summary of research results to be presented

A method to prepare exceptionally high-quality ultra-thin croconic acid films is reported. The method exploits the orientation of polar croconic acid molecules under a high electric field prior to deposition on the substrate surface, leading to the enhanced two-dimensional (2D) growth and suppressed three-dimensional (3D) growth. Thus, an ultra-thin film was prepared with a thickness approaching 20 nm and extremely low surface roughness of 4.0 nm when grown. Meanwhile, PFM results are consistent with ferroelectricity. Ultimately, it is expected that by using this method thin croconic acid films under 10 nm will be fabricated for the future study of surface and interface effects on ferroelectric properties, as well as for the potential application in commercial products.

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Nov 18th, 9:45 AM Nov 18th, 10:00 AM

Fabricating high-quality ultra-thin croconic acid film using electric field guidance

9-263

A novel method for fabricating ultra-thin croconic acid (CA) films with a very low surface roughness on Si wafers is reported. With a thickness of approximately 20 nm and surface roughness of ±2.0 nm, the film obtained far exceeds the quality and smoothness of previously reported CA thin films. The film is prepared by applying a high electric field in situ during thermal vapor deposition, promoting alignment of the CA molecules due to their high dipole moment. The result is compared with that of the best-reported film produced via a combination of thermal evaporation at low substrate temperature with subsequent slow heating, to demonstrate the greatly enhanced uniformness of the film. In addition, the film’s ferroelectric behavior is demonstrated using piezoresponse force microscopy measurements. A mechanism for film formation under electric field assisted deposition is proposed.