Presentation Title

Mass Spectrometry Study of Thermal Decomposition of Chemical Vapor Deposition Precursors

Faculty Mentor

Jingsong Zhang

Start Date

18-11-2017 9:59 AM

End Date

18-11-2017 11:00 AM

Location

BSC-Ursa Minor 146

Session

Poster 1

Type of Presentation

Poster

Subject Area

physical_mathematical_sciences

Abstract

Chemical Vapor Deposition(CVD) is a useful and effective way of producing thin films with semiconductor properties. Among the most common and useful thins films are silicon carbide(SiC) thin films. Because SiC lattices have wide band gaps, SiC thin films are effective materials for high temperature, high frequency, and high powered microelectronic applications. SiC thin films also have high wear-resistance, thermal stability, and high mechanical strength. Although SiC is a useful material for the production of microelectronics, the decomposition of known precursors, such as hexamethyldisilane, is not well understood.

Using vacuum-ultraviolet photoionization (VUV-PI) coupled with Time-of-Flight Mass Spectrometry(TOF MS), we were able to determine the masses of the reaction intermediates and the possible compounds produced during the thermal decomposition of hexamethyldisilane.

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Nov 18th, 9:59 AM Nov 18th, 11:00 AM

Mass Spectrometry Study of Thermal Decomposition of Chemical Vapor Deposition Precursors

BSC-Ursa Minor 146

Chemical Vapor Deposition(CVD) is a useful and effective way of producing thin films with semiconductor properties. Among the most common and useful thins films are silicon carbide(SiC) thin films. Because SiC lattices have wide band gaps, SiC thin films are effective materials for high temperature, high frequency, and high powered microelectronic applications. SiC thin films also have high wear-resistance, thermal stability, and high mechanical strength. Although SiC is a useful material for the production of microelectronics, the decomposition of known precursors, such as hexamethyldisilane, is not well understood.

Using vacuum-ultraviolet photoionization (VUV-PI) coupled with Time-of-Flight Mass Spectrometry(TOF MS), we were able to determine the masses of the reaction intermediates and the possible compounds produced during the thermal decomposition of hexamethyldisilane.