Presentation Title

Ultra Thin Croconic Acid Film Deposition

Faculty Mentor

Renwu Zhang

Start Date

23-11-2019 10:00 AM

End Date

23-11-2019 10:45 AM

Location

229

Session

poster 3

Type of Presentation

Poster

Subject Area

physical_mathematical_sciences

Abstract

Croconic Acid (CA) is an organic molecule that could form a single crystal with very high spontaneous polarization of ~ 20 µC/cm2, showing potential application in the field of non-volatile ferroelectric RAM. In order to achieve the miniaturizing of future generations of computational devices, the development of ultra-thin film of organic ferroelectrics is of great interest. Here we demonstrate that the thermal deposition of croconic acid under the high electric field (4kV/cm) in ultra high vacuum (UHV) can generate ultra-thin croconic acid films onto substrates. The CA films on different substrate, Si and SiO2 were explored and the interfacial structure between them were studied using slow positron annihilation beam. It was discovered that the electric field has a strong effect on Si substrate while no effect on SiO2. The underlying mechanism was proposed. In addition, the surface morphology of thin films were characterized using atomic force microscopy (AFM), and it was found that the surface roughness of the film highly depends on the pre-cleaning procedure for these substrates, which created hydrophilic surfaces. For the future study, methods of low-temperature annealing during deposing will be explored by using cold-finger liquid N2 in conjunction with an electric heating device.

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Nov 23rd, 10:00 AM Nov 23rd, 10:45 AM

Ultra Thin Croconic Acid Film Deposition

229

Croconic Acid (CA) is an organic molecule that could form a single crystal with very high spontaneous polarization of ~ 20 µC/cm2, showing potential application in the field of non-volatile ferroelectric RAM. In order to achieve the miniaturizing of future generations of computational devices, the development of ultra-thin film of organic ferroelectrics is of great interest. Here we demonstrate that the thermal deposition of croconic acid under the high electric field (4kV/cm) in ultra high vacuum (UHV) can generate ultra-thin croconic acid films onto substrates. The CA films on different substrate, Si and SiO2 were explored and the interfacial structure between them were studied using slow positron annihilation beam. It was discovered that the electric field has a strong effect on Si substrate while no effect on SiO2. The underlying mechanism was proposed. In addition, the surface morphology of thin films were characterized using atomic force microscopy (AFM), and it was found that the surface roughness of the film highly depends on the pre-cleaning procedure for these substrates, which created hydrophilic surfaces. For the future study, methods of low-temperature annealing during deposing will be explored by using cold-finger liquid N2 in conjunction with an electric heating device.