Presentation Title

Determining Optimal Growth Conditions of Ferroic Oxide Thin Films

Faculty Mentor

Dr. Sara Callori

Start Date

23-11-2019 10:45 AM

End Date

23-11-2019 11:30 AM

Location

244

Session

poster 4

Type of Presentation

Poster

Subject Area

physical_mathematical_sciences

Abstract

Determining Optimal Growth Conditions of Ferroic Oxide Thin Films

As electronic technology is pushed to smaller scales, new ways to write and control data storage and novel advanced sensor materials are needed. The development of transition metal oxide thin films has great potential to meet these challenges with nanoscale systems, particularly through the engineering of new magnetic materials. In order to investigate these materials, high quality samples must first be made. Here we have used off-axis rf-magnetron sputter deposition to begin preparing films of two materials: SrRuO3 and La 1-xSrxMnO3, two magnetic metals, with the main goal of optimizing growth conditions. Sputter deposition uses an argon plasma to ablate a ceramic target made of the desired film material, which is then transferred to a substrate. This process can be thought of as putting a layer of Lego bricks on a Lego grass template. Various growth parameters were tuned, including chamber pressure, desired gas flow, and substrate temperature. Additionally, we studied the effect of hydrothermal etching and high temperature annealing on substrates prior to film deposition, which can lead to improved film quality. The samples were characterized using atomic force microscopy to image sample surfaces and x-ray diffraction to probe their crystal structure and film thickness.

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Nov 23rd, 10:45 AM Nov 23rd, 11:30 AM

Determining Optimal Growth Conditions of Ferroic Oxide Thin Films

244

Determining Optimal Growth Conditions of Ferroic Oxide Thin Films

As electronic technology is pushed to smaller scales, new ways to write and control data storage and novel advanced sensor materials are needed. The development of transition metal oxide thin films has great potential to meet these challenges with nanoscale systems, particularly through the engineering of new magnetic materials. In order to investigate these materials, high quality samples must first be made. Here we have used off-axis rf-magnetron sputter deposition to begin preparing films of two materials: SrRuO3 and La 1-xSrxMnO3, two magnetic metals, with the main goal of optimizing growth conditions. Sputter deposition uses an argon plasma to ablate a ceramic target made of the desired film material, which is then transferred to a substrate. This process can be thought of as putting a layer of Lego bricks on a Lego grass template. Various growth parameters were tuned, including chamber pressure, desired gas flow, and substrate temperature. Additionally, we studied the effect of hydrothermal etching and high temperature annealing on substrates prior to film deposition, which can lead to improved film quality. The samples were characterized using atomic force microscopy to image sample surfaces and x-ray diffraction to probe their crystal structure and film thickness.